粉體行業(yè)在線展覽
晶體提拉設(shè)備
面議
山東力冠
晶體提拉設(shè)備
840
產(chǎn)品概述/Product Introduction:
? 直拉法晶體生長專用設(shè)備,可實現(xiàn)在高壓、真空和保護(hù)氣氛下直拉生長晶體
Special equipment for Czochralski crystal growth, which can realize Czochralski crystal growth under high pressure, vacuum and protective atmosphere
? 采用自動稱重結(jié)構(gòu),在保證晶體品質(zhì)的前提下實現(xiàn)了直拉晶體的自動生長過程
Adopting automatic weighing structure, the automatic growth process of Czochralski crystal is realized on the premise of ensuring crystal quality
產(chǎn)品特點/Product Characteristics:
? 高精度的傳感器和控制軟件
High precision sensor and control software
? 自動控制晶體外形
Automatic control of crystal shape
? **溫度:2400℃
Maximum temperature: 2400℃
? 晶體尺寸:2-8英寸
crystal size: 2-8 inches
應(yīng)用范圍/Scope:
? 應(yīng)用于氧化家(Ga?O?)單晶生長,SiC單晶、激光單晶生長
Applied to Gallium Oxide(Ga?O?)Single Crystal Growth, SiC Single Crystal Growth and Laser SingleCrystal Growth
XRD-晶向定位
CVD 真空化學(xué)氣相沉積設(shè)備
等離子體增強(qiáng)化學(xué)氣相沉積系統(tǒng)CVD
自動劃片機(jī)
BTF-1200C-RTP-CVD
FM-W-PDS
Gasboard-2060
Pentagon Qlll
等離子化學(xué)氣相沉積系統(tǒng)-PECVD
定制-電漿輔助化學(xué)氣相沉積系統(tǒng)-詳情15345079037